Ben Kaczer
Electrical and Electronic Engineering · 2000–2011
A researcher in the Science corpus: 14 papers; trusts 4 researchers and is trusted by 14 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 60 citations into it; #2,530 of 16,539 by trust here, #4,925 by citations
Whom Ben Kaczer trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
- Tibor Grasser
- Hans Reisinger
- A. E. Islam
- Souvik Mahapatra
- Stewart E. Rauch
- Dieter K. Schroder
- Asen Asenov
Who trusts Ben Kaczer overall
- Tibor Grasser
- Souvik Mahapatra
- Xiaojun Li
- Hans Reisinger
- Dieter K. Schroder
- James H. Stathis
- M. A. Alam
- A. E. Islam
- Jin Qin
- Haldun Kufluoglu
Papers from Ben Kaczer's perspective
Ordered by how strongly the researchers Ben Kaczer trusts endorse each paper. Same corpus, a different order for every researcher.
- Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification (2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual.)
- Characterization and Physical Origin of Fast Vth Transient in NBTI of pMOSFETs with SiON Dielectric (International Electron Devices Meeting)
- AC NBTI studied in the 1 Hz -- 2 GHz range on dedicated on-chip CMOS circuits (International Electron Devices Meeting)
- Material dependence of hydrogen diffusion: implications for NBTI degradation (IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.)
- RTS amplitudes in decananometer MOSFETs: 3-D simulation study
- On the Physical Mechanism of NBTI in Silicon Oxynitride p-MOSFETs: Can Differences in Insulator Processing Conditions Resolve the Interface Trap Generation versus Hole Trapping Controversy? (2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual)
- A two-stage model for negative bias temperature instability (IEEE International Reliability Physics Symposium)
- Two independent components modeling for Negative Bias Temperature Instability (IEEE International Reliability Physics Symposium)
- A critical examination of the mechanics of dynamic NBTI for PMOSFETs (IEEE International Electron Devices Meeting 2003)
- The Universality of NBTI Relaxation and its Implications for Modeling and Characterization (2007 IEEE International Reliability Physics Symposium Proceedings. 45th Annual)
Their papers
- Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification (2005) — 174 citations
- AC NBTI studied in the 1 Hz -- 2 GHz range on dedicated on-chip CMOS circuits (2006) — 147 citations
- A two-stage model for negative bias temperature instability (2009) — 222 citations
- Analytic modeling of the bias temperature instability using capture/emission time maps (2011) — 177 citations
- Ubiquitous relaxation in BTI stressing—New evaluation and insights (2008) — 259 citations
- The Universality of NBTI Relaxation and its Implications for Modeling and Characterization (2007) — 169 citations
- The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability (2010) — 291 citations
- Time-dependent defect spectroscopy for characterization of border traps in metal-oxide-semiconductor transistors (2010) — 141 citations
- Impact of MOSFET gate oxide breakdown on digital circuit operation and reliability (2000) — 269 citations
- Origin of NBTI variability in deeply scaled pFETs (2010) — 325 citations
- Consistent model for short-channel nMOSFET after hard gate oxide breakdown (2002) — 165 citations
- The Paradigm Shift in Understanding the Bias Temperature Instability: From Reaction–Diffusion to Switching Oxide Traps (2011) — 460 citations
- High-k dielectrics for future generation memory devices (Invited Paper) (2009) — 234 citations
- Relation between breakdown mode and breakdown location in short channel NMOSFETs and its impact on reliability specifications (2001) — 134 citations