James H. Stathis
Electrical and Electronic Engineering · 2000–2006
A researcher in the Science corpus: 4 papers; trusts 2 researchers and is trusted by 6 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 15 citations into it; #3,425 of 16,539 by trust here, #7,892 by citations
Whom James H. Stathis trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts James H. Stathis overall
- Dieter K. Schroder
- Xiaojun Li
- Jordi Suñé
- Jin Qin
- Hans Reisinger
- Joseph B. Bernstein
- Andreas Kerber
- Cristian Constantinescu
- Daniele Ielmini
Papers from James H. Stathis's perspective
Ordered by how strongly the researchers James H. Stathis trusts endorse each paper. Same corpus, a different order for every researcher.
- Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification (2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual.)
- A comprehensive model of PMOS NBTI degradation (Microelectronics and reliability)
- A comprehensive framework for predictive modeling of negative bias temperature instability (2004 IEEE International Reliability Physics Symposium. Proceedings)
- Physical mechanisms of negative-bias temperature instability
- A critical examination of the mechanics of dynamic NBTI for PMOSFETs (IEEE International Electron Devices Meeting 2003)
- The statistical analysis of individual defects constituting NBTI and its implications for modeling DC- and AC-stress (IEEE International Reliability Physics Symposium)
- AC NBTI studied in the 1 Hz -- 2 GHz range on dedicated on-chip CMOS circuits (International Electron Devices Meeting)
- Dynamic NBTI of PMOS transistors and its impact on device lifetime (2003 IEEE International Reliability Physics Symposium Proceedings, 2003. 41st Annual.)
- Characterization and Physical Origin of Fast Vth Transient in NBTI of pMOSFETs with SiON Dielectric (International Electron Devices Meeting)
- Analysis of NBTI Degradation- and Recovery-Behavior Based on Ultra Fast VT-Measurements (2006 IEEE International Reliability Physics Symposium Proceedings)
Their papers
- Dielectric breakdown mechanisms in gate oxides (2005) — 439 citations
- The negative bias temperature instability in MOS devices: A review (2006) — 418 citations
- Ultra-thin oxide reliability for ULSI applications (2000) — 147 citations
- Physical and predictive models of ultrathin oxide reliability in CMOS devices and circuits (2001) — 195 citations