High-k dielectrics for future generation memory devices (Invited Paper)

By J. Kittl, K. Opsomer, M. Popovici, N. Menou, Ben Kaczer, X. Wang, C. Adelmann, M. Pawlak, K. Tomida, A. Rothschild and 28 more. 2009

234 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/73f5b0914be244696ad58fc4c396f67f6ddf7ef9