Uwe Schroeder

Materials Chemistry · 2003–2021

A researcher in the Science corpus: 27 papers; trusts 21 researchers and is trusted by 12 researchers here, as inferred from the citation graph.

Subfields

Whom Uwe Schroeder trusts overall

Their strongest outbound trust, strongest first, inferred from their citations.

  1. Min Hyuk Park
  2. Johannes Müller
  3. Stefan Mueller
  4. Han Joon Kim
  5. Tony Schenk
  6. E. Grimley
  7. Sergej Starschich
  8. Thomas Mikolajick

Who trusts Uwe Schroeder overall

  1. Thomas Mikolajick
  2. Min Hyuk Park
  3. E. Grimley
  4. Tony Schenk
  5. Sergej Starschich
  6. Rohit Batra

Papers from Uwe Schroeder's perspective

Ordered by how strongly the researchers Uwe Schroeder trusts endorse each paper. Same corpus, a different order for every researcher.

  1. Ferroelectricity in hafnium oxide thin films
  2. Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories (2013 IEEE International Electron Devices Meeting)
  3. A review of recent MOSFET threshold voltage extraction methods (Microelectronics and reliability)
  4. High dielectric constant gate oxides for metal oxide Si transistors
  5. Vacancy and interstitial defects in hafnia
  6. Impact of layer thickness on the ferroelectric behaviour of silicon doped hafnium oxide thin films
  7. Review on high-k dielectrics reliability issues (IEEE transactions on device and materials reliability)
  8. Pipe-shaped BiCS flash memory with 16 stacked layers and multi-level-cell operation for ultra high density storage devices (Symposium on VLSI Technology)
  9. Vertical cell array using TCAT(Terabit Cell Array Transistor) technology for ultra high density NAND flash memory (Symposium on VLSI Technology)
  10. Novel ferroelectric FET based synapse for neuromorphic systems (Symposium on VLSI Technology)

Their papers