Structural Changes Underlying Field‐Cycling Phenomena in Ferroelectric HfO2 Thin Films
By E. Grimley, Tony Schenk, Xiahan Sang, M. Pešić, Uwe Schroeder, Thomas Mikolajick, James M. LeBeau. 2016
387 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/7ee5438b80840779f0b83d9675a20ed2a4e8372a
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In Electrical and Electronic Engineering
- Uwe Schroeder
- Thomas Mikolajick
- Tony Schenk
- James M. LeBeau
- E. Grimley
- Hyunsang Hwang
- Seungyeol Oh
- Hyungwoo Kim
Citations in the corpus
- Atomic Structure of Domain and Interphase Boundaries in Ferroelectric HfO2 (2017, methodology): “Details of the field cycling can be found in Ref.(16)”
- Large Remnant Polarization in a Wake-Up Free Hf0.5Zr0.5O2 Ferroelectric Film through Bulk and Interface Engineering (2021, background): “That is, oxygen vacancies and the electric field-induced phase transition from the non-ferroelectric phases (m- and t-phase) to the ferroelectric o-phase [28-36].”