Eduard A. Cartier
Electrical and Electronic Engineering · 2000–2009
A researcher in the Science corpus: 11 papers; trusts 7 researchers and is trusted by 2 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 44 citations into it; #10,272 of 16,539 by trust here, #2,869 by citations
- Materials Chemistry — 17 citations into it
- Atomic and Molecular Physics, and Optics — 15 citations into it
Whom Eduard A. Cartier trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts Eduard A. Cartier overall
Papers from Eduard A. Cartier's perspective
Ordered by how strongly the researchers Eduard A. Cartier trusts endorse each paper. Same corpus, a different order for every researcher.
- Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics (IEEE Electron Device Letters)
- New physics-based analytic approach to the thin-oxide breakdown statistics (IEEE Electron Device Letters)
- Ultrathin high-K gate stacks for advanced CMOS devices (International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224))
- Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
- Defect dominated charge transport in amorphous Ta2O5 thin films
- Charge trapping in ultrathin hafnium oxide (IEEE Electron Device Letters)
- Observation of bulk HfO2 defects by spectroscopic ellipsometry
- Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks
- Review on high-k dielectrics reliability issues (IEEE transactions on device and materials reliability)
- Carrier transport in HfO/sub 2//metal gate MOSFETs: physical insight into critical parameters (IEEE Transactions on Electron Devices)
Their papers
- Ultrathin high-K gate stacks for advanced CMOS devices (2001) — 224 citations
- Effective electron mobility in Si inversion layers in metal–oxide–semiconductor systems with a high-κ insulator: The role of remote phonon scattering (2001) — 738 citations
- Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues (2001) — 377 citations
- Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics (2003) — 349 citations
- Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition (2001) — 419 citations
- Reliability Challenges for CMOS Technology Qualifications With Hafnium Oxide/Titanium Nitride Gate Stacks (2009) — 183 citations
- Threshold Voltage Instabilities in High- Gate Dielectric Stacks (2005) — 179 citations
- Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films (2001) — 230 citations
- Formation of a stratified lanthanum silicate dielectric by reaction with Si(001) (2001) — 177 citations
- High-resolution depth profiling in ultrathin Al2O3 films on Si (2000) — 389 citations
- Atomic beam deposition of lanthanum- and yttrium-based oxide thin films for gate dielectrics (2000) — 234 citations