Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films
By A. Callegari, Eduard A. Cartier, M. Gribelyuk, H. Okorn-Schmidt, T. Zabel. 2001
230 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/24ac8d545b973e74b051f855355bfc491f6b232d
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- T. Furukawa
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Citations in the corpus
- Effect of Al inclusion in HfO2 on the physical and electrical properties of the dielectrics (2002, background): “Hf-silicate has been reported as a promising material with high crystallization temperature [6], [7].”