Reliability Challenges for CMOS Technology Qualifications With Hafnium Oxide/Titanium Nitride Gate Stacks

By Andreas Kerber, Eduard A. Cartier. IEEE transactions on device and materials reliability, 2009

183 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/9733b44958fb08edde0cc2154e6670ed13847cd6