Evgeni P. Gusev
Electrical and Electronic Engineering · 2000–2012
A researcher in the Science corpus: 12 papers; trusts 5 researchers and is trusted by 3 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 50 citations into it; #7,696 of 16,539 by trust here, #2,992 by citations
- Atomic and Molecular Physics, and Optics — 16 citations into it
- Materials Chemistry — 15 citations into it; #8,963 of 11,513 by trust here, #5,923 by citations
Whom Evgeni P. Gusev trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts Evgeni P. Gusev overall
Papers from Evgeni P. Gusev's perspective
Ordered by how strongly the researchers Evgeni P. Gusev trusts endorse each paper. Same corpus, a different order for every researcher.
- Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues
- Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics (IEEE Electron Device Letters)
- Charge trapping in ultrathin hafnium oxide (IEEE Electron Device Letters)
- Observation of bulk HfO2 defects by spectroscopic ellipsometry
- Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks
- Six-band k⋅p calculation of the hole mobility in silicon inversion layers: Dependence on surface orientation, strain, and silicon thickness
- On the mobility versus drain current relation for a nanoscale MOSFET (IEEE Electron Device Letters)
- Characteristics and device design of sub-100 nm strained Si N- and PMOSFETs (2002 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.01CH37303))
- Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectrics (IEEE Electron Device Letters)
- Metal-gate FinFET and fully-depleted SOI devices using total gate silicidation (Digest. International Electron Devices Meeting,)
Their papers
- Ultrathin high-K gate stacks for advanced CMOS devices (2001) — 224 citations
- Ultrathin (<4 nm) SiO2 and Si-O-N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits (2001) — 747 citations
- Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues (2001) — 377 citations
- Charge trapping related threshold voltage instabilities in high permittivity gate dielectric stacks (2003) — 302 citations
- Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectrics (2003) — 172 citations
- Microbial fuel cell (2012) — 181 citations
- Hybrid-orientation technology (HOT): opportunities and challenges (2006) — 159 citations
- Threshold voltage instabilities in high-/spl kappa/ gate dielectric stacks (2005) — 209 citations
- Threshold Voltage Instabilities in High- Gate Dielectric Stacks (2005) — 179 citations
- Ultrathin HfO 2 films grown on Silicon by atomic layer deposition for advanced gate dielectrics applications (2003) — 263 citations
- High-resolution depth profiling in ultrathin Al2O3 films on Si (2000) — 389 citations
- Structure and stability of ultrathin zirconium oxide layers on Si(001) (2000) — 625 citations