Markku Leskelä

Electrical and Electronic Engineering · 2000–2014

A researcher in the Science corpus: 17 papers; trusts 4 researchers and is trusted by 9 researchers here, as inferred from the citation graph.

Subfields

• Electrical and Electronic Engineering — 169 citations into it; #4,329 of 16,539 by trust here, #2,138 by citations
• Materials Chemistry — 139 citations into it; #3,137 of 11,513 by trust here, #2,491 by citations

Whom Markku Leskelä trusts overall

Their strongest outbound trust, strongest first, inferred from their citations.

1. Titta Aaltonen
2. Mikko Ritala
3. Jeffrey W. Elam
4. S. George
5. Evgeni P. Gusev
6. G. Wilk

Who trusts Markku Leskelä overall

1. J. Biener
2. Jin Wook Kim
3. A. Devi
4. Junling Lu
5. Hyungjun Kim
6. J. Ajayan
7. Arne Wittstock
8. Riikka L. Puurunen
9. Dong Hyeon Kim
10. Xiangbo Meng

Papers from Markku Leskelä's perspective

Ordered by how strongly the researchers Markku Leskelä trusts endorse each paper. Same corpus, a different order for every researcher.

1. Ultrathin Diffusion Barriers/Liners for Gigascale Copper Metallization
2. Atomic Layer Deposition of Platinum Thin Films
3. NIST Critically Selected Stability Constants of Metal Complexes Database
4. Novel LiCoO2 Cathode Material with Al2O3 Coating for a Li Ion Cell
5. Significant improvement of high voltage cycling behavior AlF3-coated LiCoO2 cathode
6. Extreme oxygen sensitivity of electronic properties of carbon nanotubes (Science)
7. Ruthenium Thin Films Grown by Atomic Layer Deposition
8. Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum
9. Atomic Layer Deposition of Ruthenium Thin Films for Copper Glue Layer
10. 19·9%‐efficient ZnO/CdS/CuInGaSe2 solar cell with 81·2% fill factor

Their papers

• Atomic layer deposition (ALD): from precursors to thin film structures (2002) — 1,084 citations
• Atomic layer deposition chemistry: recent developments and future challenges. (2003) — 1,007 citations
• Atomic Layer Deposition of Platinum Thin Films (2003) — 371 citations
• Ruthenium Thin Films Grown by Atomic Layer Deposition (2003) — 240 citations
• Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum (2003) — 213 citations
• Atomic Layer Deposition of Noble Metals and Their Oxides (2014) — 325 citations
• Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends (2013) — 1,304 citations
• WO3 photocatalysts: Influence of structure and composition (2012) — 356 citations
• Rare-earth oxide thin films for gate dielectrics in microelectronics (2006) — 139 citations
• Thin Film Deposition Methods for CuInSe 2 Solar Cells (2005) — 285 citations
• Crystallization in hafnia‐ and zirconia‐based systems (2004) — 155 citations
• Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature (2004) — 146 citations
• Atomic Layer Deposition of Iridium Thin Films (2004) — 139 citations
• Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water (2004) — 209 citations
• Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water (2002) — 169 citations
• Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process (2000) — 186 citations
• Effect of water dose on the atomic layer deposition rate of oxide thin films (2000) — 223 citations