Atomic Layer Deposition of Hafnium Dioxide Films from Hafnium Tetrakis(ethylmethylamide) and Water

By K. Kukli, Mikko Ritala, T. Sajavaara, J. Keinonen, Markku Leskelä. 2002

169 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/e7e102eac2519af2ee2e8f532256c8ff49056891