Titanium isopropoxide as a precursor for atomic layer deposition: characterization of titanium dioxide growth process

By J. Aarik, A. Aidla, T. Uustare, Mikko Ritala, Markku Leskelä. 2000

186 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/f4348594f5d26b770051fdf66fdbf99988ec24f0