Effect of water dose on the atomic layer deposition rate of oxide thin films

By R. Matero, A. Rahtu, Mikko Ritala, Markku Leskelä, T. Sajavaara. 2000

223 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/fe0a90cd1b5ff96472b7883f3eb9ba9070f57c10