Ruthenium Thin Films Grown by Atomic Layer Deposition

By Titta Aaltonen, P. Alén, Mikko Ritala, Markku Leskelä. 2003

240 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/4b042bb587ba559cec951fadb286b6cc14fc9692

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In Electrical and Electronic Engineering

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Y. Chi

In Materials Chemistry

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Y. Chi

Citations in the corpus

• Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature (2004, background): “Smoother films are obtained at lower deposition temperatures because of less pronounced crystal growth.(15,16) Smooth bottom electrodes have been shown to provide lower leakage currents in the memory capacitors.”