Atomic layer deposition chemistry: recent developments and future challenges.

By Markku Leskelä, Mikko Ritala. Angewandte Chemie, 2003

1,007 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/c33c5e876dd396e8d2498ffe06faabf035e94c42

How researchers see this paper

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In Electrical and Electronic Engineering

1. Marcus Bäumer
2. Zhi Zheng
3. Yong Zhang
4. A. Hamza
5. Weilie Zhou
6. J. Weissmuller
7. Xiaotao Zu
8. J. Biener

In Electronic, Optical and Magnetic Materials

1. Marcus Bäumer
2. A. Hamza
3. J. Weissmuller
4. J. Biener
5. Arne Wittstock
6. T. Baumann

In Materials Chemistry

1. J. Weissmuller
2. J. Biener
3. A. Hamza
4. Marcus Bäumer
5. Zhi Zheng
6. Yong Zhang
7. Weilie Zhou
8. Xiaotao Zu

Citations in the corpus

• Surface Chemistry in Nanoscale Materials (2009, methodology): “Consequently, the technique offers excellent atomic level control of the deposited film thickness [102–104].”