Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature

By Titta Aaltonen, Mikko Ritala, Y. Tung, Y. Chi, K. Arstila, K. Meinander, Markku Leskelä. 2004

146 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials

View Paper: https://www.semanticscholar.org/paper/73a0e59d9df9b6bcc3920ad0b47341db5c890a23