Atomic Layer Deposition of Platinum Thin Films

By Titta Aaltonen, Mikko Ritala, T. Sajavaara, J. Keinonen, Markku Leskelä. 2003

371 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/6899fa0cfa86580892b0b650f1badc0eeb6f38f7

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Michael Huth
5. Y. Chi
6. Fabrizio Porrati
7. O. Dobrovolskiy

In Materials Chemistry

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Michael Huth
5. Y. Chi
6. Fabrizio Porrati
7. O. Dobrovolskiy

Citations in the corpus

• Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature (2004, methodology): “Platinum films grown at 300 °C in our previous study were strongly (111) oriented.(23) The XRD pattern in Fig.”
• Focused electron beam induced deposition meets materials science (2017, background): “Thus, the combination of FEBID and AS-ALD merges the patterning capability of FEBID with the ability of ALD to deposit high purity and low resistive materials with good thickness control [61] and room temperature resistivity values as low as 11μΩcm [59].”