Reaction Mechanism Studies on Atomic Layer Deposition of Ruthenium and Platinum

By Titta Aaltonen, A. Rahtu, Mikko Ritala, Markku Leskelä. 2003

213 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/841aa2c94daea59b9de5732c7172672e29a0ca5a

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In Electrical and Electronic Engineering

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Y. Chi

In Materials Chemistry

1. Markku Leskelä
2. Mikko Ritala
3. Titta Aaltonen
4. Y. Chi

Citations in the corpus

• Atomic layer deposition of noble metals: Exploration of the low limit of the deposition temperature (2004, background): “In the oxygen-based processes, oxygen dissociatively adsorbs on the noble metal surface during the oxygen pulse and oxidatively decomposes the ligands of the metal precursor during the following pulse.(25) The noble metal surface thus catalytically activates the film growth reactions.”