Gennadi Bersuker
Electrical and Electronic Engineering · 2004–2015
A researcher in the Science corpus: 11 papers; trusts 2 researchers and is trusted by 1 researcher here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 73 citations into it; #14,069 of 16,539 by trust here, #5,675 by citations
- Polymers and Plastics — 10 citations into it
Whom Gennadi Bersuker trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts Gennadi Bersuker overall
Papers from Gennadi Bersuker's perspective
Ordered by how strongly the researchers Gennadi Bersuker trusts endorse each paper. Same corpus, a different order for every researcher.
- A comprehensive model of PMOS NBTI degradation (Microelectronics and reliability)
- High dielectric constant gate oxides for metal oxide Si transistors
- Negative oxygen vacancies in HfO2 as charge traps in high-k stacks
- Random Circuit Breaker Network Model for Unipolar Resistance Switching
- Vacancy and interstitial defects in hafnia
- Thermal Properties of Ultrathin Hafnium Oxide Gate Dielectric Films (IEEE Electron Device Letters)
- Metal oxide RRAM switching mechanism based on conductive filament microscopic properties (International Electron Devices Meeting)
- Highly scalable hafnium oxide memory with improvements of resistive distribution and read disturb immunity (International Electron Devices Meeting)
- Modeling the Universal Set/Reset Characteristics of Bipolar RRAM by Field- and Temperature-Driven Filament Growth (IEEE Transactions on Electron Devices)
- Metal–Oxide RRAM (Proceedings of the IEEE)
Their papers
- Metal oxide resistive memory switching mechanism based on conductive filament properties (2011) — 461 citations
- Microscopic Modeling of HfOx RRAM Operations: From Forming to Switching (2015) — 167 citations
- Resistive switching in hafnium dioxide layers: Local phenomenon at grain boundaries (2012) — 172 citations
- The effect of interfacial layer properties on the performance of Hf-based gate stack devices (2006) — 149 citations
- Mechanism of Electron Trapping and Characteristics of Traps in $\hbox{HfO}_{2}$ Gate Stacks (2007) — 144 citations
- Negative oxygen vacancies in HfO2 as charge traps in high-k stacks (2006) — 316 citations
- Grain boundaries as preferential sites for resistive switching in the HfO2 resistive random access memory structures (2012) — 186 citations
- Grain boundary mediated leakage current in polycrystalline HfO2 films (2011) — 147 citations
- A Physical Model of the Temperature Dependence of the Current Through $\hbox{SiO}_{2}\hbox{/}\hbox{HfO}_{2}$ Stacks (2011) — 191 citations
- Dipole model explaining high-k/metal gate field effect transistor threshold voltage tuning (2008) — 177 citations
- The role of nitrogen-related defects in high-k dielectric oxides: Density-functional studies (2004) — 158 citations