S. Thompson
Electrical and Electronic Engineering · IEEE Electron Device Letters · 2004–2010
A researcher in the Science corpus: 8 papers; trusts 1 researcher and is trusted by 0 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 44 citations into it
Whom S. Thompson trusts overall
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Who trusts S. Thompson overall
Papers from S. Thompson's perspective
Ordered by how strongly the researchers S. Thompson trusts endorse each paper. Same corpus, a different order for every researcher.
- Six-band k⋅p calculation of the hole mobility in silicon inversion layers: Dependence on surface orientation, strain, and silicon thickness
- Fabrication and mobility characteristics of ultra-thin strained Si directly on insulator (SSDOI) MOSFETs (IEEE International Electron Devices Meeting 2003)
- Key differences for process-induced uniaxial vs. substrate-induced biaxial stressed Si and Ge channel MOSFETs (IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004.)
- Fundamentals of Carrier Transport, 2nd edn
- CMOS design near the limit of scaling
- Dual stress liner for high performance sub-45nm gate length SOI CMOS manufacturing (IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004.)
- Physical mechanisms of electron mobility enhancement in uniaxial stressed MOSFETs and impact of uniaxial stress engineering in ballistic regime (IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest.)
- A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging (2007 IEEE International Electron Devices Meeting)
- Physics of strain effects in semiconductors and metal-oxide-semiconductor field-effect transistors
- Mechanical stress effect of etch-stop nitride and its impact on deep submicron transistor design (International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138))
Their papers
- Moore's law: the future of Si microelectronics (2006) — 601 citations
- A logic nanotechnology featuring strained-silicon (2004) — 488 citations
- Strain: A Solution for Higher Carrier Mobility in Nanoscale MOSFETs (2009) — 367 citations
- Physics of strain effects in semiconductors and metal-oxide-semiconductor field-effect transistors (2007) — 492 citations
- Key differences for process-induced uniaxial vs. substrate-induced biaxial stressed Si and Ge channel MOSFETs (2004) — 173 citations
- Uniaxial-process-induced strained-Si: extending the CMOS roadmap (2006) — 572 citations
- Strain Effect in Semiconductors (2010) — 160 citations
- Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs (2004) — 206 citations