Rolf-Peter Vollertsen
2002–2009
A researcher in the Science corpus: 3 papers; trusts 1 researcher and is trusted by 0 researchers here, as inferred from the citation graph.
Whom Rolf-Peter Vollertsen trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Papers from Rolf-Peter Vollertsen's perspective
Ordered by how strongly the researchers Rolf-Peter Vollertsen trusts endorse each paper. Same corpus, a different order for every researcher.
- New physics-based analytic approach to the thin-oxide breakdown statistics (IEEE Electron Device Letters)
- Multiple-gate SOI MOSFETs
- A continuous, analytic drain-current model for DG MOSFETs
- Beyond the conventional transistor (IBM Journal of Research and Development)
- Modeling of nanoscale gate-all-around MOSFETs (IEEE Electron Device Letters)
- Multiple-gate SOI MOSFETs: device design guidelines
- Ultra-thin oxide reliability for ULSI applications
- Disorder-controlled-kinetics model for negative bias temperature instability and its experimental verification (2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual.)
- A comprehensive model of PMOS NBTI degradation (Microelectronics and reliability)
- A critical examination of the mechanics of dynamic NBTI for PMOSFETs (IEEE International Electron Devices Meeting 2003)
Their papers
- On the Weibull shape factor of intrinsic breakdown of dielectric films and its accurate experimental determination. Part I: theory, methodology, experimental techniques (2002) — 156 citations
- Reliability Wearout Mechanisms in Advanced CMOS Technologies (2009) — 150 citations
- Experimental evidence of T/sub BD/ power-law for voltage dependence of oxide breakdown in ultrathin gate oxides (2002) — 133 citations