David L. Blackburn
Twentieth Annual IEEE Semiconductor Thermal Measurement and Management Symposium (IEEE Cat. No.04CH37545) · 2004
A researcher in the Science corpus: 1 paper; trusts 7 researchers and is trusted by 10 researchers here, as inferred from the citation graph.
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Papers from David L. Blackburn's perspective
Ordered by how strongly the researchers David L. Blackburn trusts endorse each paper. Same corpus, a different order for every researcher.
- Measurement of temperature in active high-power AlGaN/GaN HFETs using Raman spectroscopy (IEEE Electron Device Letters)
- Thermometry and Thermal Transport in Micro/Nanoscale Solid-State Devices and Structures
- SOI thermal impedance extraction methodology and its significance for circuit simulation
- Raman spectroscopy of GaN, AlGaN and AlN for process and growth monitoring/control
- 30-W/mm GaN HEMTs by field plate optimization (IEEE Electron Device Letters)
- Modeling and Measuring the Effect of Refraction on the Depth Resolution of Confocal Raman Microscopy
- Trapping effects in GaN and SiC microwave FETs (Proceedings of the IEEE)
- Temperature measurements of semiconductor devices - a review (Twentieth Annual IEEE Semiconductor Thermal Measurement and Management Symposium (IEEE Cat. No.04CH37545))
- Extremely Low On-Resistance and High Breakdown Voltage Observed in Vertical GaN Schottky Barrier Diodes with High-Mobility Drift Layers on Low-Dislocation-Density GaN Substrates
- Vertical GaN-based trench metal oxide semiconductor field-effect transistors on a free-standing GaN substrate with blocking voltage of 1.6 kV
Their papers
- Temperature measurements of semiconductor devices - a review (2004) — 332 citations