Tae-Houng Moon

Materials Chemistry · 2013–2016

A researcher in the Science corpus: 10 papers; trusts 7 researchers and is trusted by 5 researchers here, as inferred from the citation graph.

Subfields

• Materials Chemistry — 120 citations into it; #4,611 of 11,513 by trust here, #2,525 by citations
• Electrical and Electronic Engineering — 108 citations into it; #6,804 of 16,539 by trust here, #2,232 by citations

Whom Tae-Houng Moon trusts overall

Their strongest outbound trust, strongest first, inferred from their citations.

1. Min Hyuk Park

Who trusts Tae-Houng Moon overall

1. Min Hyuk Park

Papers from Tae-Houng Moon's perspective

Ordered by how strongly the researchers Tae-Houng Moon trusts endorse each paper. Same corpus, a different order for every researcher.

1. Novel ferroelectric FET based synapse for neuromorphic systems (Symposium on VLSI Technology)
2. Ferroelectricity in hafnium oxide thin films
3. Physical properties of crystals
4. Ferroelectricity revisited—Advances in materials and physics
5. Energy harvesting based on Ericsson pyroelectric cycles in a relaxor ferroelectric ceramic
6. Thermoelectrics: a review of present and potential applications
7. Electrocaloric and pyroelectric properties of 0.75Pb(Mg1∕3Nb2∕3)O3–0.25PbTiO3 single crystals
8. Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories (2013 IEEE International Electron Devices Meeting)
9. A Dielectric Polymer with High Electric Energy Density and Fast Discharge Speed (Science)
10. A review of recent MOSFET threshold voltage extraction methods (Microelectronics and reliability)

Their papers

• Ferroelectricity and Antiferroelectricity of Doped Thin HfO2‐Based Films (2015) — 1,047 citations
• Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer (2014) — 250 citations
• The effects of crystallographic orientation and strain of thin Hf0.5Zr0.5O2 film on its ferroelectricity (2014) — 372 citations
• Ferroelectricity in undoped-HfO2 thin films induced by deposition temperature control during atomic layer deposition (2016) — 136 citations
• Toward a multifunctional monolithic device based on pyroelectricity and the electrocaloric effect of thin antiferroelectric HfxZr1−xO2 films (2015) — 195 citations
• Study on the size effect in Hf0.5Zr0.5O2 films thinner than 8 nm before and after wake-up field cycling (2015) — 152 citations
• Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes (2014) — 156 citations
• Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes (2014) — 138 citations
• Thin HfxZr1‐xO2 Films: A New Lead‐Free System for Electrostatic Supercapacitors with Large Energy Storage Density and Robust Thermal Stability (2014) — 314 citations
• Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature (2013) — 725 citations