Study on the degradation mechanism of the ferroelectric properties of thin Hf0.5Zr0.5O2 films on TiN and Ir electrodes

By Min Hyuk Park, Han Joon Kim, Y. Kim, Woongkyu Lee, Tae-Houng Moon, Keum Do Kim, C. S. Hwang. 2014

156 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/126d6c47da0b3bc4c07b5715b786e84441deaa19