Evolution of phases and ferroelectric properties of thin Hf0.5Zr0.5O2 films according to the thickness and annealing temperature

By Min Hyuk Park, Han Joon Kim, Y. Kim, Woongkyu Lee, Tae-Houng Moon, C. S. Hwang. 2013

725 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/bacdc5c73886ea571276fdfed9fdbd6e08a783a2