John H. Davies
2001–2003
A researcher in the Science corpus: 4 papers; trusts 3 researchers and is trusted by 4 researchers here, as inferred from the citation graph.
Whom John H. Davies trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts John H. Davies overall
Papers from John H. Davies's perspective
Ordered by how strongly the researchers John H. Davies trusts endorse each paper. Same corpus, a different order for every researcher.
- AND T
- RTS amplitudes in decananometer MOSFETs: 3-D simulation study
- Intrinsic parameter fluctuations in decananometer MOSFETs introduced by gate line edge roughness
- Increase in the random dopant induced threshold fluctuations and lowering in sub-100 nm MOSFETs due to quantum effects: a 3-D density-gradient simulation study
- Γ and B
- Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations
- Temperature-Dependent Thermal Conductivity of Undoped Polycrystalline Silicon Layers
- Process Technology Variation (IEEE Transactions on Electron Devices)
- Fringing fields in sub-0.1 μm fully depleted SOI MOSFETs: optimization of the device architecture
- Impact of Line-Edge Roughness on FinFET Matching Performance (IEEE Transactions on Electron Devices)
Their papers
- RTS amplitudes in decananometer MOSFETs: 3-D simulation study (2003) — 254 citations
- Intrinsic threshold voltage fluctuations in decanano MOSFETs due to local oxide thickness variations (2002) — 223 citations
- Increase in the random dopant induced threshold fluctuations and lowering in sub-100 nm MOSFETs due to quantum effects: a 3-D density-gradient simulation study (2001) — 237 citations
- Simulation of intrinsic parameter fluctuations in decananometer and nanometer-scale MOSFETs (2003) — 599 citations