3.8-MV/cm Breakdown Strength of MOVPE-Grown Sn-Doped $\beta $ -Ga2O3 MOSFETs
By A. Green, K. Chabak, E. Heller, R. Fitch, M. Baldini, A. Fiedler, K. Irmscher, Günter Wagner, Z. Galazka, S. Tetlak and 3 more. IEEE Electron Device Letters, 2016
427 citations recorded by the source corpus.
Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/780fdcedf3d48ac0b68699d2dd3a180a3c8b7bdf
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In Electronic, Optical and Magnetic Materials
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Citations in the corpus
- Progress of Ultra-Wide Bandgap Ga2O3 Semiconductor Materials in Power MOSFETs (2020, methodology): “For breakdown characteristics of D-mode Ga2O3 planar MOSFETs, the breakdown electric field of 3.8 MV/cm [24], and the blocking voltages of 1850 [171] and 2321 V [27] have been reported over the past four years.”
- Enhancement-Mode Ga2O3 Vertical Transistors With Breakdown Voltage >1 kV (2018, background): “The experimentally reported critical electric field up to 5.2 MV/cm [4], [5] already exceeds that of SiC and GaN [6], and electron mobility of 100-150 cm2/Vs has been achieved in both bulk substrates [7] as well as epitaxial layers [8].”
- 1.85 kV Breakdown Voltage in Lateral Field-Plated Ga2O3 MOSFETs (2018, methodology): “age breakdown strength is also calculated by dividing net gate-drain voltage (VB R-Vg) over Lgd [8] and is displayed in Fig.”
- $\beta$ -Ga2O3 MOSFETs for Radio Frequency Operation (2017, background): “: β-GA2O3 MOSFETS FOR RADIO FREQUENCY OPERATION 791 half of the original channel layer was etched leaving ∼90 nm of epitaxy as measured by surface profilometry.”