Enhancement-Mode Ga2O3 Vertical Transistors With Breakdown Voltage >1 kV

By Zongyang Hu, K. Nomoto, Wenshen Li, N. Tanen, Kohei Sasaki, Akito Kuramata, Tohru Nakamura, Debdeep Jena, Huili Grace Xing. IEEE Electron Device Letters, 2018

222 citations recorded by the source corpus.

High-voltage vertical Ga<sub>2</sub>O<sub>3</sub> MISFETs are developed employing halide vapor phase epitaxial (HVPE) layers on bulk Ga<sub>2</sub>O<sub>3</sub> (001) substrates. The low charge concentration of ~10<sup>16</sup> cm<sup>−3</sup> in the n-drift region allows three terminal breakdown voltages to reach up to 1057 V without field plates. The devices operate in the enhancement mode (E-mode) with a threshold voltage of ~1.2–2.2 V, a current ON/OFF ratio of ~10<sup>8</sup>, an ON resistance of ~13–18 <inline-formula> <tex-math notation="LaTeX">$\text{m}\Omega {}\cdot \text{cm}^{2}$ </tex-math></inline-formula>, and an output current of >300 A/cm<sup>2</sup>. This is the first report of high-voltage vertical Ga<sub>2</sub>O<sub>3</sub> transistors with E-mode operation, a significant milestone toward realizing Ga<sub>2</sub>O<sub>3</sub> based power electronics.

Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/72bf64972966e3daa43c49652c6da10e1f81c5d2

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In Electronic, Optical and Magnetic Materials

  1. Uttam Singisetti
  2. Ke Zeng
  3. Lei Yuan
  4. Yuming Zhang
  5. Hongpeng Zhang
  6. Xiaoyan Tang
  7. Jichao Hu
  8. Jianwu Sun

In Materials Chemistry

  1. Uttam Singisetti
  2. Ke Zeng
  3. Lei Yuan
  4. Yuming Zhang
  5. Hongpeng Zhang
  6. Xiaoyan Tang
  7. Jichao Hu
  8. Jianwu Sun

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