J. Gudmundsson
Mechanics of Materials · 2001–2020
A researcher in the Science corpus: 10 papers; trusts 13 researchers and is trusted by 6 researchers here, as inferred from the citation graph.
Subfields
- Mechanics of Materials — 81 citations into it; #1,979 of 6,291 by trust here, #745 by citations
- Electrical and Electronic Engineering — 65 citations into it; #2,931 of 16,539 by trust here, #4,110 by citations
- Materials Chemistry — 47 citations into it; #3,363 of 11,513 by trust here, #5,094 by citations
- Aerospace Engineering — 16 citations into it
- Electronic, Optical and Magnetic Materials — 13 citations into it
- Atomic and Molecular Physics, and Optics — 5 citations into it; #3,360 of 7,135 by trust here, #6,772 by citations
Whom J. Gudmundsson trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
- A. Anders
- Ulf Helmersson
- A. Ehiasarian
- D. Lundin
- J. Alami
- K. Sarakinos
- P. Kelly
- S. Konstantinidis
- Jean-Pierre Boeuf
- Francis F. Chen
Who trusts J. Gudmundsson overall
Papers from J. Gudmundsson's perspective
Ordered by how strongly the researchers J. Gudmundsson trusts endorse each paper. Same corpus, a different order for every researcher.
- A and V
- AND T
- Γ and B
- The Mn+1AXn phases: Materials science and thin-film processing
- On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
- On the film density using high power impulse magnetron sputtering
- Handbook of physical vapor deposition (PVD) processing
- I and i
- A structure zone diagram including plasma based deposition and ion etching - eScholarship
- Influence of cultivation temperature on the ligninolytic activity of selected fungal strains
Their papers
- Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces (2005) — 236 citations
- On the film density using high power impulse magnetron sputtering (2010) — 389 citations
- Ionized physical vapor deposition (IPVD): A review of technology and applications (2006) — 1,011 citations
- High power impulse magnetron sputtering discharge (2012) — 678 citations
- On the effect of the electron energy distribution on the plasma parameters of an argon discharge : a global (volume-averaged) model study (2001) — 178 citations
- Physics and technology of magnetron sputtering discharges (2020) — 401 citations
- The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge (2006) — 311 citations
- Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge (2002) — 191 citations
- Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge (2001) — 144 citations
- Electronegativity of low-pressure high-density oxygen discharges (2001) — 198 citations