High power impulse magnetron sputtering discharge
By J. Gudmundsson, N. Brenning, D. Lundin, Ulf Helmersson. 2012
678 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials
View Paper: https://www.semanticscholar.org/paper/91cada32624d5b7f64e63e0273ef260dfd322573
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In Electrical and Electronic Engineering
In Materials Chemistry
In Mechanics of Materials
Citations in the corpus
- Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands (2018, result): “When compared to conventional magnetron sputtering, the studies about this technique have shown significant improvements in coating structure, properties, and adhesion [89,90].”
- An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “Moreover, the metal ions generated in the HiPIMS plasma are found to be highly energetic.(7) From ionenergy measurements in HiPIMS discharges, it has been found that the average ion energy in the bulk plasma during the discharge pulse is around 20 eV without the use of any substrate bias.”
- Silver nanowire coated threads for electrically conductive textiles (2015, background): “Common textile coating techniques include electroless plating [7], sputtering [8], and dip coating [9].”