On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering

By J. Alami, K. Sarakinos, F. Uslu, Matthias Wuttig. 2009

144 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering, Materials Chemistry, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/e2d9518dc93b3b51849c14aeba2ded01d6f35a1a

How researchers see this paper

The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.

In Electrical and Electronic Engineering

1. D. Lundin
2. K. Sarakinos
3. A. Anders
4. J. Gudmundsson

In Materials Chemistry

1. D. Lundin
2. K. Sarakinos
3. A. Anders

In Mechanics of Materials

1. D. Lundin
2. K. Sarakinos
3. A. Anders
4. J. Gudmundsson

Citations in the corpus

• An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “It is, therefore, evident that the low-energy highflux ion irradiation during HiPIMS can be used to overcome the characteristically underdense and rough microstructures and obtain morphologies unique for low-temperature sputter deposition.(31) This, in turn, allows growth of films with higher hardne”
• A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS) (2014, background): “Widely practiced for compound films, including nitrides [77, 199, 291-293], carbides [294], oxides [277, 295-302], and more complex compounds [303, 304].”