Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces

By J. Alami, P. Persson, D. Music, J. Gudmundsson, Johan Böhlmark, Ulf Helmersson. 2005

236 citations recorded by the source corpus.

Subfields: Computational Mechanics, Electrical and Electronic Engineering, Mechanics of Materials

View Paper: https://www.semanticscholar.org/paper/19c2a2af7757d3c81cfdc97b3cec8dcf00f48acf

How researchers see this paper

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In Computational Mechanics

1. K. Sarakinos
2. D. Lundin

In Electrical and Electronic Engineering

1. D. Lundin
2. K. Sarakinos
3. A. González‐Elipe
4. Á. Barranco
5. A. Borrás
6. A. Palmero

In Mechanics of Materials

1. D. Lundin
2. K. Sarakinos
3. A. González‐Elipe
4. Á. Barranco
5. A. Borrás
6. A. Palmero

Citations in the corpus

• Perspectives on oblique angle deposition of thin films: From fundamentals to devices (2016, background): “, in a OAD configuration) to the target than instead of classic parallel configuration [194].”
• An introduction to thin film processing using high-power impulse magnetron sputtering (2012, methodology): “Reprinted from Alami et al.(15) with permission from the American Institute of”