Handbook of physical vapor deposition (PVD) processing
By D. M. Mattox. 2010
952 citations recorded by the source corpus.
Subfields: Automotive Engineering, Biomedical Engineering, Surfaces, Coatings and Films
View Paper: https://www.semanticscholar.org/paper/a356364b66f07834d8942df0f3cafea216b79da2
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In Automotive Engineering
In Biomedical Engineering
In Surfaces, Coatings and Films
Citations in the corpus
- On Coating Techniques for Surface Protection: A Review (2019, background): “It provides th advantage of flexibility in using any organic and inorganic material s a d position layer while the coating layer offers high hardness and corrosion resistance [16].”
- A structure zone diagram including plasma based deposition and ion etching - eScholarship (2010, background): “This SZD has become a classic a nd is reproduced in many text books on physical vapor deposition [2, 5-7].”
- Metal oxide nanoscience and nanotechnology for chemical sensors (2013, neutral): “027 Some of the preparation techniques employed for metal oxides preparation require one or more thermal treatment [7–10], which usually accomplish stoichiometry, stabilize crystalline phase, grain size, porosity, interfaces, and defects.”
- Nanomanufacturing—Perspective and applications (2017, background): “In typical PVD, the film thickness is 1–1000 nm and the deposition speed can be controlled at 1–10 nm/s [150].”
- An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “In magnetron sputtering techniques, variation of the deposition parameters allows for control of the energy transferred to the film-forming species enabling the manipulation of the film properties.(1,89) Among the various ways used to provide energy to the growing film, bombardment by ionized specie”
- Review of Growth Defects in Thin Films Prepared by PVD Techniques (2020, methodology): “The properties of thin films deposited by different PVD techniques depend on the cleanliness of the substrate surface on which the film is deposited [47].”
- The use of hollow cathodes in deposition processes: A critical review (2015, background): “Table 1 shows the ionization and metastable energies of various gases used in deposition processes [54,55].”
- Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands (2018, background): “The process cycle time depends mainly on the vacuum chamber size and its pumping system [17].”
- Significance of calcium phosphate coatings for the enhancement of new bone osteogenesis--a review. (2014, methodology): “Furthermore, other different physical deposition techniques, such as PLD [54-64], MAPLE [60, 65-69], IBAD [70-77], and RF-magnetron sputtering [77-85], are available.”