A structure zone diagram including plasma based deposition and ion etching - eScholarship

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An introduction to thin film processing using high-power impulse magnetron sputtering (2012, background): “The microstructure is determined primarily by surface and bulk diffusion processes,(91,119) which are controlled by the deposition temperature, the bombardment by energetic species, and the incorporation of impurities that act as inhibitors for the crystal and grain growth.(91,119,122) Deposition at”
Oxidation kinetics of Cr-coated zirconium alloy: Effect of coating thickness and microstructure (2020, background): “Thus, porous Cr coatings are formed with V shaped columnar grains perpendicular to the substrate surface (zone T according to the structural zone model (SZM) [30,31]).”
Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment (2012, background): “,(23) recently generalized to high normalized energy fluxes by Anders.(62) Summarizing, we can cite Brice and coworkers: “.”
Solid particle erosion mechanisms of protective coatings for aerospace applications (2014, background): “4: Representation of the structure zone model proposed by Anders [36] showing the effects of deposition parameters on the coating microstructure.”