FinFET scaling to 10 nm gate length

By B. Yu, Leland Chang, Shibly S. Ahmed, H. Wang, S. Bell, Chih-Yuh Yang, C. Tabery, C. Ho, Q. Xiang, Tsu-Jae King and 4 more. Digest. International Electron Devices Meeting,, 2002

626 citations recorded by the source corpus.

View Paper: https://www.semanticscholar.org/paper/d0c3e2de60a8f5abff147e2a32072f400b09d620

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