Statistical characterization of trap position, energy, amplitude and time constants by RTN measurement of multiple individual traps
By T. Nagumo, K. Takeuchi, T. Hase, Y. Hayashi. International Electron Devices Meeting, 2010
137 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/455c551b6b55aff5633d0b2c191e1797b0c780ec
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In Atomic and Molecular Physics, and Optics
In Electrical and Electronic Engineering
- Tibor Grasser
- Hans Reisinger
- Thomas Aichinger
- Ben Kaczer
- D. Fleetwood
- Michael Nelhiebel
- Philipp Hehenberger
- Wolfgang Goes
Citations in the corpus
- The Paradigm Shift in Understanding the Bias Temperature Instability: From Reaction–Diffusion to Switching Oxide Traps (2011, background): “[62], who demonstrated that the depth of the defect is uncorrelated with the characteristic time”
- $1/f$ Noise and Defects in Microelectronic Materials and Devices (2015, background): “Fast trapping and recovery events that occur during NBTI measurements on s-to-ms time scales also can result from interactions of charge carriers with either interface traps or fast border traps [88], [89], [127]–[132], [134], [135], [148].”