A Phenomenological Model for the Reset Mechanism of Metal Oxide RRAM
By Shimeng Yu, H. Philip Wong. IEEE Electron Device Letters, 2010
197 citations recorded by the source corpus.
Subfields: Cellular and Molecular Neuroscience, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/59b1c6727f557c89ec10f70f8bc3eaa6e7d1aa6e
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Cellular and Molecular Neuroscience
- Shimeng Yu
- H. Philip Wong
- Ximeng Guan
- Duygu Kuzum
- Yi Wu
- Rakesh Gnana David Jeyasingh
- Daniele Ielmini
- Ilia Valov
In Electrical and Electronic Engineering
- Shimeng Yu
- H. Philip Wong
- Ximeng Guan
- Daniele Ielmini
- Duygu Kuzum
- Yuan Xie
- Zhang Tao
- Rajeev Balasubramonian
Citations in the corpus
- An Electronic Synapse Device Based on Metal Oxide Resistive Switching Memory for Neuromorphic Computation (2011, background): “Owing to the exponential voltage–time relationship [38] in the switching dynamics, it was found that linearly varying”
- Emerging Memory Technologies: Recent Trends and Prospects (2016, unknown): “The switching of RRAM includes unipolar and bipolar modes depending on the oxide and electrode materials system [19].”
- Overcoming the challenges of crossbar resistive memory architectures (2015, background): “A critical characteristic of an ReRAM cell is that its switching time is inversely exponentially related to the voltage applied on the cell [10, 54].”
- Compact Modeling of Conducting-Bridge Random-Access Memory (CBRAM) (2011, background): “However, measurements of the fast metal ion diffusivity in CBRAM devices [37] reveal that the switching time is limited by the time for ion migration through the solid electrolyte rather than the electrochemical reaction time for the ions to be”
- On the Switching Parameter Variation of Metal-Oxide RRAM—Part I: Physical Modeling and Simulation Methodology (2012, background): “The RESET of the device is associated with the process in which the oxygen ions from the anode/dielectric interface migrate back into the dielectric layer, recombining with the oxygen vacancies (or equivalently, oxidizing the metal precipitates) and thus rupturing the conducting filaments [20], [21]”