Drain voltage scaling in carbon nanotube transistors

By M. Radosavljevic, S. Heinze, J. Tersoff, Phaedon Avouris. 2003

175 citations recorded by the source corpus.

Decreasing the oxide thickness in carbon nanotube field-effect transistors (CNFETs) improves the turn-on behavior. However, we demonstrate that this also requires scaling the range of the drain voltage. This scaling is needed to avoid an exponential increase in off-current with drain voltage, due to modulation of the Schottky barriers at both the source and drain contact. We illustrate this with results for bottom-gated ambipolar CNFETs with oxides of 2 and 5 nm, and give an explicit scaling rule for the drain voltage. Above the drain voltage limit, the off-current becomes large and has equal electron and hole contributions. This allows the recently reported light emission from appropriately biased CNFETs.

Subfields: Biomedical Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/0cfa610fee5e7b56eb8eab4fcd5439f4a751810d

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In Biomedical Engineering

  1. Phaedon Avouris
  2. Mark S. Lundstrom
  3. Zhihong Chen
  4. Joerg Appenzeller
  5. Jing Guo
  6. Supriyo Datta
  7. Yu-ming Lin
  8. Joachim Knoch

In Materials Chemistry

  1. Phaedon Avouris
  2. Joerg Appenzeller
  3. Joachim Knoch
  4. Zhihong Chen
  5. Yu-ming Lin
  6. Jing Guo
  7. Mark S. Lundstrom
  8. Supriyo Datta

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