Enhancement-mode Ga2O3 wrap-gate fin field-effect transistors on native (100) β-Ga2O3 substrate with high breakdown voltage
By K. Chabak, N. Moser, A. Green, D. Walker, S. Tetlak, E. Heller, A. Crespo, R. Fitch, J. McCandless, K. Leedy and 5 more. 2016
318 citations recorded by the source corpus.
Sn-doped gallium oxide (Ga2O3) wrap-gate fin-array field-effect transistors (finFETs) were formed by top-down BCl3 plasma etching on a native semi-insulating Mg-doped (100) β-Ga2O3 substrate. The fin channels have a triangular cross-section and are approximately 300 nm wide and 200 nm tall. FinFETs, with 20 nm Al2O3 gate dielectric and ∼2 μm wrap-gate, demonstrate normally-off operation with a threshold voltage between 0 and +1 V during high-voltage operation. The ION/IOFF ratio is greater than 105 and is mainly limited by high on-resistance that can be significantly improved. At VG = 0, a finFET with 21 μm gate-drain spacing achieved a three-terminal breakdown voltage exceeding 600 V without a field-plate.
Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/03db9a3bbf668940dead6ee219e50150fee9e17f
How researchers see this paper
The researchers whose trusted networks rank it highest, strongest advocate first. Every researcher gets a different order.
In Electronic, Optical and Magnetic Materials
In Materials Chemistry
Citations in the corpus
- Enhancement-Mode Ga2O3 Vertical Transistors With Breakdown Voltage >1 kV (2018, methodology): “In this work, we demonstrate the first high-voltage vertical Ga2O3 MISFETs or FinFETs with E-mode operation and a breakdown voltage over 1 kV.”
- Progress of Ultra-Wide Bandgap Ga2O3 Semiconductor Materials in Power MOSFETs (2020, methodology): “Hence, for actual device, where both energy barriers are combined in the gated region, the Vbi(g) is reasonably close to the measured reverse sweep VFB , [138] and the maximum depletion width (Wd) is extracted by (2) [175].”
- $\beta$ -Ga2O3 MOSFETs for Radio Frequency Operation (2017, background): “High voltage β-Ga2O3 MOSFET operation has already made large strides including EC measurements greater than GaN or SiC’s theoretical limit [5] and blocking voltages >600V for both enhancement [6] and depletion-mode [7] devices.”