K. Xiong

Electrical and Electronic Engineering · 2005–2006

A researcher in the Science corpus: 4 papers; trusts 2 researchers and is trusted by 2 researchers here, as inferred from the citation graph.

Subfields

• Electrical and Electronic Engineering — 45 citations into it; #10,635 of 16,539 by trust here, #7,422 by citations
• Materials Chemistry — 26 citations into it; #9,958 of 11,513 by trust here, #9,513 by citations
• Atomic and Molecular Physics, and Optics — 17 citations into it

Whom K. Xiong trusts overall

Their strongest outbound trust, strongest first, inferred from their citations.

1. John Robertson
2. P. Peacock
3. Adam S. Foster

Who trusts K. Xiong overall

1. John Robertson
2. D. Fleetwood

Papers from K. Xiong's perspective

Ordered by how strongly the researchers K. Xiong trusts endorse each paper. Same corpus, a different order for every researcher.

1. Ultrathin high-K gate stacks for advanced CMOS devices (International Electron Devices Meeting. Technical Digest (Cat. No.01CH37224))
2. AND T
3. I and J
4. Strong plasmonic enhancement of photovoltage in graphene. (Nature Communications)
5. Supercapacitors based on flexible graphene/polyaniline nanofiber composite films. (ACS Nano)
6. Large, solution-processable graphene quantum dots as light absorbers for photovoltaics. (Nano letters (Print))
7. Inkjet-printed graphene electronics. (ACS Nano)
8. Three-dimensional bicontinuous ultrafast-charge and -discharge bulk battery electrodes. (Nature Nanotechnology)
9. Electrochromic Systems and the Prospects for Devices
10. The design and application of multifunctional structure-battery materials systems

Their papers

• Band gaps and defect levels in functional oxides (2006) — 165 citations
• Defect energy levels in HfO2 high-dielectric-constant gate oxide (2005) — 445 citations
• Defect states in the high-dielectric-constant gate oxide LaAlO3 (2006) — 150 citations
• Passivation of oxygen vacancy states in HfO2 by nitrogen (2006) — 146 citations