P. Zantye
2004
A researcher in the Science corpus: 1 paper; trusts 2 researchers and is trusted by 5 researchers here, as inferred from the citation graph.
Whom P. Zantye trusts overall
Their strongest outbound trust, strongest first, inferred from their citations.
Who trusts P. Zantye overall
Papers from P. Zantye's perspective
Ordered by how strongly the researchers P. Zantye trusts endorse each paper. Same corpus, a different order for every researcher.
- Material removal mechanism in chemical mechanical polishing: theory and modeling
- Low-k dielectric materials
- Determination of pore-size distribution in low-dielectric thin films
- Investigation of creep behaviour under load during indentation experiments and its influence on hardness and modulus results
- Mechanical Properties of Solid Polymers: Third Edition
- Effect of Particle Size of Chemical Mechanical Polishing Slurries for Enhanced Polishing with Minimal Defects
- A plasticity-based model of material removal in chemical-mechanical polishing (CMP)
- Development of an optimized condition-based maintenance system by data fusion and reliability-centered maintenance
- Parameter estimation and model selection for a class of hysteretic systems using Bayesian inference
- WEAR MONITORING IN TURNING OPERATIONS USING VIBRATION AND STRAIN MEASUREMENTS
Their papers
- Chemical mechanical planarization for microelectronics applications (2004) — 596 citations