Carbon nanotubes for interconnect applications

By Franz Kreupl, Andrew Graham, M. Liebau, Georg S. Duesberg, R. Seidel, E. Unger. IEDM Technical Digest. IEEE International Electron Devices Meeting, 2004., 2002

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We briefly review the status of the application of carbon nanotubes (CNTs) for future interconnects and present results concerning possible integration schemes. Growth of single nanotubes at lithographically defined locations (vias) has been achieved which is a prerequisite for the use of CNTs as future interconnects. For the 20 nm node a current density of 5/spl middot/10/sup 8/ A/cm/sup 2/ and a resistance of 7.8 k/spl Omega/ could be achieved for a single multi-walled CNT vertical interconnect.

Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/4b2337b5bab014f2ba422f61b16bf9761441554f

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In Atomic and Molecular Physics, and Optics

  1. Wen-Yan Yin
  2. J. Mao
  3. Kaustav Banerjee
  4. Hong Li
  5. Yehia Massoud
  6. Arthur Nieuwoudt
  7. Eric Pop
  8. Chuan Xu

In Electrical and Electronic Engineering

  1. Hong Li
  2. Kaustav Banerjee
  3. Chuan Xu
  4. Navin Srivastava
  5. Eric Pop
  6. Roberto Suaya
  7. Wen-Yan Yin
  8. Franz Kreupl

In Materials Chemistry

  1. Hong Li
  2. Kaustav Banerjee
  3. Chuan Xu
  4. Eric Pop
  5. Kenneth E. Goodson
  6. Navin Srivastava
  7. Wen-Yan Yin
  8. J. Mao

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