Iron-induced deep-level acceptor center in GaN/AlGaN high electron mobility transistors: Energy level and cross section

By M. Silvestri, Michael J. Uren, Martin Kuball. Applied Physics Letters, 2013

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Dynamic transconductance dispersion measurements coupled with device physics simulations were used to study the deep level acceptor center in iron-doped AlGaN/GaN high electron mobility transistors (HEMT). From the extracted frequency dependent trap-conductance, an energy level 0.7 eV below the conduction band and a capture cross section of 10−13 cm2 were obtained. The approach presented in this work avoids the non-equilibrium electrical or optical techniques that have been used to date and extracts the device relevant trap characteristics in short channel AlGaN/GaN HEMTs. Quantitative prediction of the trap induced transconductance dispersion in HEMTs is demonstrated.

Subfields: Condensed Matter Physics, Electronic, Optical and Magnetic Materials, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/267897cfe2af157670c1d6ca485cebaa1356a29d

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In Condensed Matter Physics

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  2. Matteo Meneghini
  3. Enrico Zanoni
  4. Alessandro Chini
  5. S. Karpov

In Electronic, Optical and Magnetic Materials

  1. Matteo Meneghini
  2. Enrico Zanoni
  3. Gaudenzio Meneghesso
  4. Alessandro Chini

In Materials Chemistry

  1. S. Karpov

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