Electrical properties of β-Ga2O3 single crystals grown by the Czochralski method
By K. Irmscher, Z. Galazka, Mike Pietsch, R. Uecker, R. Fornari. 2011
486 citations recorded by the source corpus.
Subfields: Electronic, Optical and Magnetic Materials, Materials Chemistry
View Paper: https://www.semanticscholar.org/paper/141d4bb1720db0d118be641fe9a7f1ab54695f3f
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In Electronic, Optical and Magnetic Materials
In Materials Chemistry
Citations in the corpus
- 1.85 kV Breakdown Voltage in Lateral Field-Plated Ga2O3 MOSFETs (2018, background): “tronics applications due to its high Baliga’s Figure of Merit (BFoM) [1], and also due to the mature bulk crystal growth technologies [2]–[3].”
- Field-Plated Lateral $\beta$ -Ga2O3 Schottky Barrier Diode With High Reverse Blocking Voltage of More Than 3 kV and High DC Power Figure-of-Merit of 500 MW/cm2 (2018, unknown): “promising for commercial products [14]–[16].”
- High-Performance Depletion/Enhancement-ode $\beta$ -Ga2O3 on Insulator (GOOI) Field-Effect Transistors With Record Drain Currents of 600/450 mA/mm (2016, methodology): “In addition to its excellent material property, potential cost effective substrate can be realized through Czochralski method [11], [12].”