Electrical observations of filamentary conductions for the resistive memory switching in NiO films
By D. C. Kim, S. Seo, Seung‐Eon Ahn, D. Suh, Myoung-Jae Lee, B. Park, I. Yoo, I. Baek, Hae-Sung Kim, E. Yim and 6 more. 2006
518 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering, Polymers and Plastics
View Paper: https://www.semanticscholar.org/paper/6442c4ddfd8b3a0502a59174c99f842439c92183
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In Electrical and Electronic Engineering
- Daniele Ielmini
- Andrea Leonardo Lacaita
- A. L. Lacaita
- Enrique Miranda
- Shibing Long
- U. Russo
- H. Philip Wong
- Shimeng Yu
In Polymers and Plastics
Citations in the corpus
- Filament Conduction and Reset Mechanism in NiO-Based Resistive-Switching Memory (RRAM) Devices (2009, methodology): “fact, the most current-demanding operation of the memory cell, particularly for unipolar RRAM where currents in a few mA range are usually reported [5], [8], [12], [14], [15].”
- Model for the Resistive Switching Effect in $ \hbox{HfO}_{2}$ MIM Structures Based on the Transmission Properties of Narrow Constrictions (2010, background): “Several models have been proposed to this aim, which invoke mechanisms like the formation and rupture of conducting filaments [2], chargetrapping and defect-controlled switching [3], and electron hopping in domains undergoing insulator–metal transitions [4], among others.”