R. Clark
Electrical and Electronic Engineering · with Smith · 2018–2020
A researcher in the Science corpus: 3 papers; trusts 1 researcher and is trusted by 0 researchers here, as inferred from the citation graph.
Subfields
- Electrical and Electronic Engineering — 41 citations into it
Whom R. Clark trusts
Their strongest outbound trust, strongest first, inferred from their citations.
- S. Bent (in Electrical and Electronic Engineering)
Papers from R. Clark's perspective
Ordered by how strongly the researchers R. Clark trusts endorse each paper. Same corpus, a different order for every researcher.
- Ferroelectric hafnium oxide: A CMOS-compatible and highly scalable approach to future ferroelectric memories (2013 IEEE International Electron Devices Meeting)
- Charge-Trapping Phenomena in HfO2-Based FeFET-Type Nonvolatile Memories (IEEE Transactions on Electron Devices)
- Why Is FE–HfO2 More Suitable Than PZT or SBT for Scaled Nonvolatile 1-T Memory Cell? A Retention Perspective (IEEE Electron Device Letters)
- Device modeling of ferroelectric memory field-effect transistor (FeMFET)
- Room temperature magnetic quantum cellular automata (Science)
- Majority Logic Gate for Magnetic Quantum-Dot Cellular Automata (Science)
- Logical computation using algorithmic self-assembly of DNA triple-crossover molecules (Nature)
- Nanotube molecular wires as chemical sensors (Science)
- Field-Effect Tunneling Transistor Based on Vertical Graphene Heterostructures (Science)
- Extreme oxygen sensitivity of electronic properties of carbon nanotubes (Science)
Their papers
- Area-Selective Deposition: Fundamentals, Applications, and Future Outlook (2020) — 279 citations
- Perspective: New process technologies required for future devices and scaling (2018) — 151 citations
- Critical Role of Interlayer in Hf0.5Zr0.5O2 Ferroelectric FET Nonvolatile Memory Performance (2018) — 300 citations