10×10nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation

By B. Govoreanu, G. Kar, Y. Y. Chen, V. Paraschiv, S. Kubicek, A. Fantini, I. Radu, L. Goux, S. Clima, R. Degraeve and 11 more. International Electron Devices Meeting, 2011

684 citations recorded by the source corpus.

Subfields: Electrical and Electronic Engineering

View Paper: https://www.semanticscholar.org/paper/ac420aad10d7081ecedb50f42793c01d71e48ec0

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In Electrical and Electronic Engineering

  1. Daniele Ielmini
  2. Shimeng Yu
  3. H. Philip Wong
  4. Ximeng Guan
  5. Furqan Zahoor
  6. Farooq Ahmad Khanday
  7. Tun Zainal Azni Zulkifli
  8. Abu Sebastian

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