Carrier scattering induced by thickness fluctuation of silicon-on-insulator film in ultrathin-body metal–oxide–semiconductor field-effect transistors
By K. Uchida, S. Takagi. 2003
142 citations recorded by the source corpus.
Subfields: Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/fd5bad45d9fe094310375ea46dfc36654fe5e290
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In Atomic and Molecular Physics, and Optics
In Electrical and Electronic Engineering
Citations in the corpus
- A Graphene Field-Effect Device (2007, background): “7 nm films [15][16] and electron mobility has been found to drop below μe = 70 cm(2)/Vs in tSi = 2.”
- Modeling of Surface-Roughness Scattering in Ultrathin-Body SOI MOSFETs (2007, background): “also containing offdiagonal elements, which yields the wellknown t(6)s dependence of the mobility [11]–[13].”