A Graphene Field-Effect Device

By M. Lemme, T. Echtermeyer, M. Baus, H. K. A. M. C. Aachen, A. GmbH, Aachen, Germany, Institute of Semiconductor Electronics, Rwth Aachen University. IEEE Electron Device Letters, 2007

957 citations recorded by the source corpus.

In this letter, a top-gated field-effect device (FED) manufactured from monolayer graphene is investigated. Except for graphene deposition, a conventional top-down CMOS-compatible process flow is applied. Carrier mobilities in graphene pseudo-MOS structures are compared to those obtained from the top-gated Graphene-FEDs. The extracted values exceed the universal mobility of silicon and silicon-on-insulator MOSFETs

Subfields: Electrical and Electronic Engineering, Materials Chemistry

View Paper: https://www.semanticscholar.org/paper/9b785988395ae528d0edf1ecd57d8336e0d0a677

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In Electrical and Electronic Engineering

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In Materials Chemistry

  1. K. Novoselov
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  7. Andrea C. Ferrari
  8. A.K. Geim

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