Conduction mechanism of TiN/HfOx/Pt resistive switching memory: A trap-assisted-tunneling model
By Shimeng Yu, Ximeng Guan, H. Philip Wong. 2011
390 citations recorded by the source corpus.
Subfields: Electrical and Electronic Engineering
View Paper: https://www.semanticscholar.org/paper/fb439416d39493c2ce833c0ac6ebf893e9107433
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In Electrical and Electronic Engineering
- Shimeng Yu
- H. Philip Wong
- Ximeng Guan
- Razali Ismail
- Ee Wah Lim
- Daniele Ielmini
- Pai-Yu Chen
- Ilia Valov
Citations in the corpus
- Conduction Mechanism of Valence Change Resistive Switching Memory: A Survey (2015, methodology): “The Schottky or thermionic emission happens when thermally-activated electrons injected over the energy barrier into the conduction band of the oxide as shown in Figure 4 [55].”
- On the Switching Parameter Variation of Metal-Oxide RRAM—Part I: Physical Modeling and Simulation Methodology (2012, methodology): “The electronic part involved in the operation of the cell has been discussed in an experimental work in [23] and [24], which concludes that the TAT through the Vo is the dominant conduction mechanism in the cell.”